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US Patent Issued to Powerchip Semiconductor Manufacturing on April 21 for "Wafer stacking process" (Taiwanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,797, issued on April 21, was assigned to Powerchip Semiconductor Manufacturing Corp. (Hsinchu, Taiwan). "Wafer stacking process" was inven... Read More


US Patent Issued to Tencent Technology on April 21 for "Coating method for making chip, chip substrate, and chip" (Chinese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,799, issued on April 21, was assigned to Tencent Technology Co. Ltd. (Shenzhen, China). "Coating method for making chip, chip substrate, a... Read More


US Patent Issued to CHANGXIN MEMORY TECHNOLOGIES on April 21 for "Method for forming semiconductor device and semiconductor device" (Chinese Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,800, issued on April 21, was assigned to CHANGXIN MEMORY TECHNOLOGIES INC. (Hefei City, China). "Method for forming semiconductor device a... Read More


US Patent Issued to Imec vzw on April 21 for "Metallization process for an integrated circuit" (Belgian Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,801, issued on April 21, was assigned to Imec vzw (Leuven, Belgium). "Metallization process for an integrated circuit" was invented by Vic... Read More


US Patent Issued to CHANGXIN MEMORY TECHNOLOGIES on April 21 for "Method for forming contact structure, semiconductor structure and memory" (Chinese Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,802, issued on April 21, was assigned to CHANGXIN MEMORY TECHNOLOGIES INC. (Hefei City, China). "Method for forming contact structure, sem... Read More


US Patent Issued to NANYA TECHNOLOGY on April 21 for "Semiconductor device structure with reduced critical dimension and method for preparing the same" (Taiwanese Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,803, issued on April 21, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Semiconductor device structure with reduced cr... Read More


US Patent Issued to NANYA TECHNOLOGY on April 21 for "Contact structure, semiconductor device comprising the same, and method for fabricating the same" (Taiwanese Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,804, issued on April 21, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Contact structure, semiconductor device compri... Read More


US Patent Issued to NANYA TECHNOLOGY on April 21 for "Semiconductor device with polymer liner and method for fabricating the same" (Taiwanese Inventor)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,805, issued on April 21, was assigned to NANYA TECHNOLOGY Corp. (New Taipei City, Taiwan). "Semiconductor device with polymer liner and me... Read More


US Patent Issued to Intel on April 21 for "Interconnect structures with nitrogen-rich dielectric material interfaces for low resistance vias in integrated circuits" (Oregon Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,806, issued on April 21, was assigned to Intel Corp. (Santa Clara, Calif.). "Interconnect structures with nitrogen-rich dielectric materia... Read More


US Patent Issued to SAMSUNG ELECTRONICS on April 21 for "Integrated circuit devices including a back side power distribution network structure and methods of forming the same" (New York, Virginia Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,807, issued on April 21, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (South Korea). "Integrated circuit devices including a back side pow... Read More